Laboratory for extreme light sources
Using pumped plasmas, we can amplify high quality ultrashort X-ray pulses, generated from infrared (IR) pulse by high harmonic generation (HHG). The production of XUV radiation enables the study of atomic and molecular processes, allowing for better understanding of quantum dynamics of electrons and their interactions in chemical and biological systems, e.g. the realization of extreme nonlinear optics, quantum interference effects, and molecular self-probing. We will also develop soft x-ray radiation (2.34-4.4 nm) from laser plasmas to image and diagnose various bio-relevant processes.
The other aspect of this lab is to develop and study EUV laser plasma source for new generation photo-lithography technology for production of semiconductor devices. Typical spectral range relevant for development of such technique is from 14 down to 5 nm. Therefore, the EUV radiation, ranging between 10-124 nm in wavelength, is recognized as the next critical-dimension imaging solution. The success of new generation photo-lithography depends on three interconnected factors:
- brightness of EUV source (conversion efficiency)
- focusing depth and durability
- efficiency of mirrors for EUV light
